The staff of the Center took part in the annual all-Russia scientific and technical conference ‘New materials and technologies – 2008’. At the conference held on November 11-12, 2008, the specialists of the Center presented the talk "Some particularities in organization of the specialized manufacturing of the masks for the microchips with the designed rules up to 0.13 micron". The theses are published in the log of the conference.
Manufacture of binary photo masks of level to 180 nanometers
Use of the modern equipment at all production phases