home
Shared Use Centre Photomask
Design and Manufacture
+7 (499) 720-69-67
russia version Рус   contacts Contacts
english version Eng   site map Site map

Products
Services
About us
Contacts

109
photomask.ru / Products

Products

The Center offers a photomask manufacture for conducting of lithographic processes in the following ways:

  1. contact photolithography, image scale 1:1;
  2. projection photolithography, image scale 10:1, 5:1, 4:1.

The photomasks are produced on substrates of soda lime or synthetic quartz with a chromic masking layer.

Dimension types of the photomasks to be produced: 127x127x2,24 mm (5009), 

152х152х6,35 mm (6025), 177,4х177,4х3,1 mm (7012).

The quartz photomasks of a dimension type 152х152х6,35 mm can be equipped with pellicles.

Main specifications of the photomasks to be produced:

Minimal feature on photomask (μm) Type of photomask Specifications
CD to target
(+/-μm)
Registration
(μm)
Defect size
(μm)
0,6-0,9 Binary
≥0,08
≥0,15
≥0,25
1-2 Binary
≥0,1
≥0,15
≥0,25
2,5-5 Binary
≥0,1
≥0,15
≥0,5
>5 Binary
≥0,1
≥0,15
≥0,5
Manufacture according to the international standards
Manufacture according to the international standards
Consultations from experts in the course of formation and order execution
Consultations from experts in the course of formation and order execution



Our partners
MIET Vistec KBTEM-OMO

SCPDM
© 2008-2015 
e-mail Contacts
+7 (499) 720-69-67