Data preparation of photomask includes conversion and layout of initial data of Customer in accordance with the specifications as well as addition of service, test and other special elements.
During a process of photomask data preparation there are carried out a checkup of initial information in accordance with the rules of data preparation and a fragmentation of data, if necessary there is applied a full-functional correction system of optical proximity effects, there is also generated an output information. At the final stage the obtained data are converted into the control information for image generators.
Necessary data operations, Boolean operations, phase correction, geometrical correction, setting of technological allowances and other operations are executed with the help of a software-hardware complex on the basis of modern CAD methods allowing processing the input data in accordance with DXF, GDSII, OASIS formats.